NXQ 4008 R&D and Production Contact Mask Aligner Substrate size from pieces to 200 mm diameter Manual X, Y and theta alignment stage Vacuum / Pressure contact exposure modes Optical Splitfield and CCTV microscope options Simple, topside mask loading Low maintenance
NXQ 4008
R&D and Production Contact Mask Aligner
Substrate size from pieces to 200 mm diameter Manual X, Y and theta alignment stage Vacuum / Pressure contact exposure modes Optical Splitfield and CCTV microscope options Simple, topside mask loading Low maintenance