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2011 |
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Neutronix Introduces the NXQ8006 Sapphire
01/11/2011
1/11/2011- With the increased demand for LED processing on compound semiconductor substrates up to 6”, Neutronix-Quintel has developed the NXQ8006 Sapphire Mask Alignment System that is dedicated for optimal performance in this sector. With a lower price point than the NXQ8008 as well as an industry leading throughput of over 200 wafers per hour in First Mask Mode and over 140 wafers per hour with autoalignment, the NXQ8006 Sapphire is one of the highest Return on Investment (ROI) mask aligners available in the marketplace.
For more info see our products page
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Neutronix-Quintel Introduces the NXQ4008 Mask Aligner
06/24/2010
6/24/2010-
With increased demand for lab and manual load production for 8" wafers, Neutronix-Quintel has developed an 8" version of the popular NXQ4000 series mask aligners. "This allows our customers to process 8" wafers at a relatively low cost compared to traditional 8" equipment" said Brett Arnold, CEO of Neutronix-Quintel. "The NXQ4008, can still be tooled to process small pieces, and wafer sizes up to 8", making it a very versatile tool for R&D or volume manufacturing."
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Neutronix-Quintel Reinforces European Sales Organization
11/20/2009
11/20/09 - Neutronix-Quintel reinforces European Sales Organization
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Neutronix-Quintel Introduces the new NXQ8000 Platform
06/15/2009
6/15/09 - Neutronix-Quintel Introduces the NXQ8000 Mask Aligner Platform
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Neutronix-Quintel represents AML Bonders in North America
05/02/2009
5/2/09 - Neutronix-Quintel becomes an authorized Sales and Service Represntative for AML Wafer Bonders
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Semi-Directory
10/23/2008
Semi-Directory
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Spare-Parts List
08/14/2008
Our recommended spares lists for each product line is now available for viewing.
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Make the Jump to Next-Generations Contact Aligners
07/23/2007
Published in issue of Chip Design Magazine, by Brett Arnold, President and CEO, Neutronix Inc. and Quintel Corp.
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LED Technology
07/14/2007
LED Technology is Reaping the Benefits of Customized Mask Aligner Technology
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Photolithography Mask Aligner Creates New Opportunities in MEMS
07/01/2007
Photolithography Mask Aligner Creates New Opportunities in MEMS
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