Exposure System Tools and Components 

• DIELECTRIC 360-420 NM U.V. COLD MIRROR - reduces broad band exposures when used as a replacement for the first or second bending mirror in the U.V. Illuminator. Lowers maintenance by reducing mask expansion and run out. Available for the PLA 501 series.
• DUAL CHANNEL LIGHT INTEGRATION CONVERSION KITS - improves the aligner's energy dose control. Available for the PLA 501 and PLA 600 systems.
• REPLACEMENT MIRRORS - standard and custom mirrors designed to specifically reduce heat and thermal induced runout. Available for the PLA 501 series.
• RECOATED MIRRORS AVAILABLE - recoating services available for all MPA mirrors at tremendous savings and short lead times!
• REGULATED / FEEDBACK POWER SUPPLIES AND RETROFITS - supplies a constant source of power and intensity to your aligner. Eliminates fluctuations and power surge problems. Available for the PLA 501 series.
• CUSTOM CALIBRATOR PLATES - for special applications, we offer full-face plates for calibrations to irregularshaped substrates up to 5". Please call to discuss your requirements. Available for the PLA 501 series.
• COMPLETE CHUCK ASSEMBLIES - eliminates wafer sticking problems with standard or custom-designedwafer chucks. Available for the PLA 501 series.
• U.V. POWER CONVERSIONS - decreases exposure time and increases through-put.    

Conversions available: 350 Watt Regulated or F.B. 500 Watt Regulated or F.B. 500 Watt High Efficiency

Available for the PLA 501 and 600 systems. 1 Kilowatt 2 Kilowatt

U.V. SPECTRUM CONVERSION - optimizes process requirements with standard and customized Deep U.V., Near Deep U.V. and/or Near U.V. Lightsources. Available for the PLA 501 series.